MNC 2008

The document "MNC 2008" was published on "2022-10-19T15:27:50" on the website "ConfIDent" under the URL https://confident-conference.org/index.php/Event:MNC 2008.

The document "MNC 2008" describes an event in the sense of a conference.

The document "MNC 2008" contains information about the event "MNC 2008" with start date "Oct 27, 2008" and end date "Oct 30, 2008".

The event "MNC 2008" is part of the event series identified by [[]]

Deadlines

2008-06-30

30 Jun 2008

Submission

Venue

Fukuoka, Japan

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MNC 2008 SCOPE and SYMPOSIUM
1-1:DUV, VUV, EUV Lithography and Metrology
1-2:Electron- and Ion-Beam Lithography
1-3:Resist Materials and Processing
2-1:Nanodevices
2-2:Nanofabrication
2-3:Nanomaterials
2-4:Nano-Tool
3:Nanoimprint, Nanoprint and Rising Lithography
4:Bio MEMS, Lab on a Chip
5:Microsystem Technology and MEMS

Symposium A. Lithography Technology for 32nm node device
Symposium B. Sensor Applications of Micro- process and Nanotechnology
Symposium C. Nanoimprint Technology
		
Conference Site:
JAL Resort Sea Hawk Hotel Fukuoka, Japan

IMPORTANT DATE

Abstract Deadline:
June 30, 2008

Late News Paper :
September 1, 2008

Registration:
October , 2008

JJAP Proceeding
October 30, 2008
	

This CfP was obtained from WikiCFP